PUMA
Istituto dei materiali per l'elettronica ed il magnetismo     
Barrera M., PlÓ J., Bocchi C., Migliori A. Antireflecting-passivating dielectric films on crystalline silicon solar cells for space applications. In: Solar Energy Materials and Solar Cells, vol. 92 (9) pp. 1115 - 1122. Elsevier, 2008.
 
 
Abstract
(English)
Antireflecting-passivating TiO2-SiO2 double layers on crystalline silicon (Si) were optimized and characterized for space solar cells applications. In the numeric optimization, the MgF2-glass-adhesive-TiO2-SiO2-Si structure was considered. In order to fabricate the TiO2-SiO2 double layer, titanium films were deposited on Si wafers in a vacuum chamber, and then, the sample was annealed in oxygen at high temperatures. Glasses with evaporated MgF2 thin films were bonded to the TiO2-SiO2-Si samples so as to obtain the complete structure. A gain of up to 23.5% in the maximum power is demonstrated for simulated c-Si solar cells using the optimized structure. Characterization of the TiO2-SiO2-Si structure using transmission electron microscopy (TEM) and X-ray reflectivity (XRR) as well as optical characterization are presented.
URL: http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6V51-4SPSHDH-1&_user=6689909&_coverDate=09%2F30%2F2008&_rdoc=23&_fmt=high&_orig=browse&_srch=doc-info(%23toc%235773%232008%23999079990%23692835%23FLA%23display%23Volume)&_cdi=5773&_sort=d&_docancho
DOI: 10.1016/j.solmat.2008.03.021
Subject Dielectric film
Solar Cells
Structural characterization


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